Globally recognized : USA, Singapore & Malaysia Patents

USA Patent No. : US 8,257,507 B2 Method for Drying a Substrate
USA Patent No. : US 8,302,242 B2 Apparatus and Method for Cleaning Substrates/Media Disks
USA Patent No. : US 8,465,595 B2 Apparatus and Method for Cleaning Substrates/Media Disks
USA Patent No. : US 8,544,482 B2 Method for Drying a Substrate
USA Patent No. : US 8,771,430 B2 Method for Drying a Substrate
Singapore Patent No. : P-No.168393 An Apparatus for Washing a Workpiece
Malaysia Patent No. : MY – 146880 Method for Drying a Substrate
Malaysia Patent No. : MY – 147281 An Apparatus for Washing a Workpiece

Global Companies Filling Patents Using Invenpro Equipment

USA Patent No. : US 8,002,901 B1 Temperature Dependent Pull Speeds for Drying of a Wet Cleaned Workpiece.

USA Patent Application No. : US 2012/0058258
A1 Methods of Cleaning Hard Drive Disk Substrates for Nanoimprint Lithography.

Cleanroom Conveyor Certifications By Fraunhofer Ipa Germany

Certified for motorized conveyor module operating in ISO 4 (Class 10) cleanroom environment.